Plasma Etch

Plasma Etch PE-50-LF Plasma Etcher with vacuum pump

Name: Plasma Etch PE-50-LF Plasma Etcher with vacuum pump
Brand: Plasma Etch
SKU: PCLU02C1
Price: 3700.0 USD
Availability: OutOfStock

$3,700.00 USD

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SKU #: PCLU02C1

The Plasma Etch PE-50 is a compact, entry-level benchtop plasma cleaning and etching system designed for research labs, universities, and small production facilities. The "LF" (Low Frequency) designation typically refers to its standard 50-80kHz RF generator, though 13.56MHz high-frequency options are also available for specific etching needs

Technical Notes

The unit was connected to an Edwards E2M1.5 vacuum pump. The display is clear, and all buttons are responsive. Flow adjustment on both flowmeter were checked and found to be functional. We performed a run with air as the processing gas. The vacumm chamber was evacuated quickly to the set target vacuum level. Plasma started when voltage was applied. Chamber vent valve appears to be functional. See video for details.

Defects

No defects observed

Included with the purchase